Trimethylaluminum. NASA releasing it into the atmosphere, as well as an additive to jet fuel. "A route to nanoscopic materials via sequential infiltration synthesis on block copolymer templates." "Sequential infiltration synthesis (SIS), combining stepwise molecular assembly reactions with self-assembled block copolymer (BCP) substrates, provides a new strategy to pattern nanoscopic materials in a controllable way. The selective reaction of a metal precursor with one of the pristine BCP domains is the key step in the SIS process. Here we present a straightforward strategy to selectively modify self-assembled polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP thin films to enable the SIS of a variety of materials including SiO(2), ZnO, and W. The selective and controlled interaction of trimethyl aluminum with carbonyl groups in the PMMA polymer domains generates Al-CH(3)/Al-OH sites inside the BCP scaffold which can seed the subsequent growth of a diverse range of materials without requiring complex block copolymer design and synthesis." ---------- "straightforward strategy to selectively modify self-assembled polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP thin films to enable the SIS of a variety of materials including SiO(2), ZnO, and W." "selective reaction of a metal precursor" SiO2 = Silicon dioxide, ZnO = Zinc oxide, W = Tungsten "selective and controlled interaction of trimethyl aluminum with carbonyl groups" self-assembled = nanotechnology ncbi.nlm.nih.gov/pubmed/21545142 _____________
Posted on: Wed, 14 Aug 2013 00:16:46 +0000
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